India’s First Silicon Carbide Facility

Article Title: India’s First Silicon Carbide Facility

16-09-2024

Environment & Ecology Current Affairs Analysis

Why in the News?

India's first silicon carbide manufacturing plant is set to be established in Odisha with an investment of Rs 620 crore.

  • The facility, developed by RIR Power Electronics Limited, a key player in semiconductor power electronics, will be located at EMC Park in Infovalley, Bhubaneswar.

Silicon Carbide (SiC)

  • It is a compound made of silicon and carbon.
  • It has excellent heat conductivity, which makes it ideal for high-temperature applications.
  • It is chemically inert and resistant to corrosion by acids, alkalis and salts.
  • It has a very high melting point, around 2,730°C (4,950°F).

Acheson process: It is produced by this process where silica (SiO₂) and carbon (usually in the form of petroleum coke) are heated to high temperatures in an electric furnace.

  • This process forms SiC crystals and releases carbon dioxide as a by-product.

Uses

  • High-temperature semiconductor devices like diodes, MOSFETs (metal-oxide-semiconductor field-effect transistors).
  • Abrasive materials such as grinding wheels, sandpapers, cutting tools, and bulletproof vests.
  • Electric vehicles (EVs) and hybrid vehicles for power conversion, improving energy efficiency and reducing heat generation.
  • Solar power inverters, LEDs and Aerospace components.